Water splitting by visible-light using CdS semiconductor thin film

Maste

HLA 적합도가 이식신장의 생존에 미치는 영향

학위논문(석사)--서울대학교 보건대학원 :보건학과 보건정책학 전공,2001.Maste

VHTR 중대사고 해석을 위한 흑연 구조체 및 SiC 피복층 산화 실험

학위논문(박사) - 한국과학기술원 : 원자력및양자공학과, 2014.2, [ ix, 98 p. ]The experimental study of oxidation behavior of the graphite structure and the SiC layer in TRISO was performed to estimate the safety relevant phenomena for Very High Temperature Reactors (VHTR) during air-ingress and steam-ingress postulated accidents. For the integrity of oxidized graphite during the air-ingress accidents we performed the experiments and the modeling on the strength degradation of oxidized graphite structures. We measured the compressive strength and the buckling strength of oxidized IG-110, IG-430, and NBG-10 graphite columns. We derived an empirical straight-line formula to estimate the buckling strength. The formula is expressed in terms of a single parameter, slenderness ratio over the intersection between compressive and buckling strength so that it may be applicable to any type-graphite column. The experimentally derived Knudsen relation with a corrected burn-off in the present study is applicable for predicting the strength degradation of the graphite column which is oxidized in Zone 1 and Zone 2. The strength degradation of the graphite column oxidized in Zone 3 can be evaluated by developing the empirical straight line formula. The combination of the empirical straight-line formula and the Knudsen relation with a corrected burn-off can enable us to predict the strength degradation of a graphite column with oxidization in Zones 1, 2 and 3. The strength of the oxidized graphite column is dependent on the initial strength and burn-off, even though the graphite columns have the different dimensions and the different failure modes. The strength degradation depends on two parameters, a corrected burn-off and a slenderness ratio. We developed and validated a unified model for the strength degradation of oxidized graphite structure. We introduced the concept of the f-value, which is defined as the fraction of the surface reaction to the total reaction. The fraction of the maximum allowable burn-off for the integrity of the support structu...한국과학기술원 : 원자력및양자공학과

An oxetane-containing compound, a photoresist composition comprising the same, a method for preparing a pattern using the photoresist composition and an inkjet print head

본 발명은 하기 화학식 1또는 2를 갖는 옥세탄-함유 화합물, 이를 포함한 포토레지스트 조성물, 상기 포토레지스트 조성물을 이용한 패턴 형성 방법 및 상기 옥세탄-함유 화합물의 중합 결과물을 포함한 잉크젯 프린트 헤드에 관한 것이다:<화학식 1> <화학식 2> 상기 화학식 1 중, Q1, Q2, Q3, Q4, Q5, Q6, Q7, Q8, L1, L2, a, b, c, d, e, f, g, h 및 n은 발명의 상세한 설명을 참조한다. 본 발명을 따르는 옥세탄-함유 화합물은 중합성이 우수하여 포토레지스트로 이용될 수 있으며, 이의 중합 결과물은 내열성, 내화학성, 접착성, 내구성 등이 우수하다