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1 research outputs found
Improved 20nm device yield and gate dielectric integrity with optimized aluminum metal fill process
Author
Anuj Patel
Chulwan An
+17 more
Clint Bordelon
David Williams
Hee Sung Kang
Ian Guerassio
Jinho Seo
Jun-Han Kim
Jungmin Park
Kin-Sang Lam
Nikhil Bharat Hira
Paul Coppala
Paul D. Kirsch
Paul Nester
Ryan Paulsen
Sergei Drizlikh
Steven Trigno
Sunjong Wang
Taegyun Kim
Publication venue
IEEE
Publication date
01/05/2016
Field of study
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