154 research outputs found

    Sidewall depletion in nano-patterned LAO/STO heterostructures

    Full text link
    We report the fabrication of nanostructures from the quasi-two-dimensional electron gas (q2DEG) formed at the LaAlO3_{3}/ SrTiO3_{3} (LAO/STO) interface. The process uses electron beam lithography in combination with reactive ion etching. This technique allows to pattern high-quality structures down to lateral dimensions as small as 100100nm while maintaining the conducting properties without inducing conductivity in the STO substrate. Temperature dependent transport properties of patterned Hall bars of various widths show only a small size dependence of conductivity at low temperature as well as at room temperature. The deviation can be explained by a narrow lateral depletion region. All steps of the patterning process are fully industry compatible.Comment: 5 pages, 4 figure

    Enhancement of spin mixing conductance in La<sub>0.7</sub>Sr<sub>0.3</sub>MnO<sub>3</sub>/LaNiO<sub>3</sub>/SrRuO<sub>3</sub> heterostructures

    Get PDF
    Spin pumping and the effective spin-mixing conductance in heterostructures based on magnetic oxide trilayers composed of La0.7Sr0.3MnO3 (LSMO), LaNiO3 (LNO), and SrRuO3 (SRO) are investigated. The heterostructures serve as a model system for an estimation of the effective spin-mixing conductance at the different interfaces. The results show that by introducing a LNO interlayer between LSMO and SRO, the total effective spin-mixing conductance increases due to the much more favorable interface of LSMO/LNO with respect to the LSMO/SRO interface. Nevertheless, the spin current into the SRO does not decrease because of the spin diffusion length of λLNO ≈ 3.2nm in the LNO. This value is two times higher than that of SRO. The results show the potential of using oxide interfaces to tune the effective spin-mixing conductance in heterostructures and to bring novel functionalities into spintronics by implementing complex oxides

    Coupling of germanium quantum dots with collective sub-radiant modes of silicon nanopillar arrays

    Get PDF
    In this paper, we demonstrate the infrared photoluminescence emission from Ge(Si) quantum dots coupled with collective Mie modes of silicon nanopillars. We show that the excitation of band edge dipolar modes of a linear nanopillar array results in strong reshaping of the photoluminescence spectra. Among other collective modes, the magnetic dipolar mode with the polarization along the array axis contributes the most to the emission spectrum, exhibiting an experimentally measured Q-factor of around 500 for an array of 11 pillars. The results belong to the first experimental evidence of light emission enhancement of quantum emitters applying collective Mie resonances in finite nanoresonators and therefore represent an important contribution to the new field of active all-dielectric meta-optics.DAAD, Grant No. 57387479Federal Ministry for Education and Research (“Bundesministerium für Bildung und Forschung”, Project N. 03Z2HN12)Joint German-Russian Research Project RFBR-DFG No. 20-52-12062European Union’s Horizon 2020 research and innovation programme under the Marie Sklodowska-Curie Grant Agreement No 84528

    Atomic layer deposition of cobalt phosphide for efficient water splitting

    Get PDF
    Transition‐metal phosphides (TMP) prepared by atomic layer deposition (ALD) are reported for the first time. Ultrathin Co‐P films were deposited by using PH3 plasma as the phosphorus source and an extra H2 plasma step to remove excess P in the growing films. The optimized ALD process proceeded by self‐limited layer‐by‐layer growth, and the deposited Co‐P films were highly pure and smooth. The Co‐P films deposited via ALD exhibited better electrochemical and photoelectrochemical hydrogen evolution reaction (HER) activities than similar Co‐P films prepared by the traditional post‐phosphorization method. Moreover, the deposition of ultrathin Co‐P films on periodic trenches was demonstrated, which highlights the broad and promising potential application of this ALD process for a conformal coating of TMP films on complex three‐dimensional (3D) architectures
    corecore