103 research outputs found
Toward 22 nm: fast and effective intrafield monitoring and optimization of process windows and critical dimension uniformity
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Imaging enhancement (low k1 imaging) in EUV lithography: current status and future resolution enhancement techniques
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Imaging enhancement (low k1 imaging) in EUV lithography: current status and future resolution enhancement techniques
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Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArF<sub>i</sub>and extreme ultraviolet lithography
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