17 research outputs found
Toxicity, Tunneling and Feeding Behavior of the Termite, Coptotermes vastator, in Sand Treated with Oil of the Physic Nut, Jatropha curcas
Oil of the physic nut, Jatropha curcas L. (Malpighiales: Euphorbiaceae), was evaluated in the laboratory for its barrier and repellent activity against the Philippine milk termite Coptotermes vastator Light (Isoptera: Rhinotermitidae). The study showed that J. curcas oil had anti-feeding effect, induced reduction in tunneling activity and increased mortality in C. vastator. Behavior of termites exposed to sand treated with J. curcas oil indicated that it is toxic or repellent to C. vastator. Toxicity and repellent thresholds, were higher than those reported for other naturally occurring compounds tested against the Formosan subterranean termite
Modeling the copper microstructure and elastic anisotropy and studying its impact on reliability in nanoscale interconnects
Nanoindentation for reliability assessment of ULK films and interconnects structures
© 2012 Elsevier B.V. All rights reserved. The structural integrity of interconnect structures containing ultra-low-k (ULK) dielectrics is highly dependent on the mechanical properties of the porous dielectrics, e.g. fracture toughness elastic modulus and adhesion as well. Four-point-bending (FPB) and double-cantilever-beam (DCB) methods for the evaluation of fracture properties require out-of-fab sample preparation and testing. The reliable characterization of interfacial adhesion is important for in-line/at-line process development and control in microelectronics manufacturing. The ability to detect an out-of-spec or defective ULK film at an early process step could potentially save processing and materials cost. Therefore, the development of quick turnaround experimental methodologies for monitoring in-line/at-line mechanical stability of ULK films and ULK-containing interconnects is of great interest for semiconductor industry. This study presents two novel experimental approaches for the evaluation of interface adhesion and mechanical robustness of on-chip interconnects structures based on nanoindentation and nanoscratch, (a) wedge indentation and (b) bump assisted BEOL stability indentation (BABSI) tests, respectively. Wedge indentation tests on ULK films with increasing porosity show a decrease of adhesion values. Correspondingly, BABSI tests show increasing failure rates for Cu/ULK interconnect structures containing mechanically weaker dielectrics
Residual stress measurement in thin films at sub-micron scale using Focused Ion Beam milling and imaging
Residual stress evaluation in thin films at the sub-micron scale was achieved in the present study using a semi-destructive trench-cutting (ring-core) method. Focused Ion Beam was employed to introduce the strain relief by milling the slots around an "island" and also to record the images for strain change evaluation by digital image correlation analysis of micrographs. Finite element simulation was employed to predict the curves for strain relief as a function of milling depth, and compared with the experimental measurements, showing good agreement. An empirical mathematical description of the curves was proposed that allows efficient data analysis for residual stress evaluation. © 2011 Elsevier B.V. All rights reserved
A singular edge-based smoothed finite element method (ES-FEM) for bimaterial interface cracks
10.1007/s00466-009-0422-3Computational Mechanics452-3109-125CMME
