Electromigration theory unified

The starting formula of Bosvieux and Friedel for the force on an ion in a metal due to an applied voltage is shown to lead to the same description as the linear-response approach used in the field since its introduction by Kumar and Sorbello. By this electromigration theory has become a unified theory. It follows after accounting for a treacherous trap term, which at first sight seems to be zero. Up to now Bosvieux and Friedel claimed to predict a completely screened direct force, which means that only a wind force would be operative. In addition the amount of screening has been calculated up to second order in the potential of the migrating impurity, using a finite temperature version of the screening term derived by Sham. For a proton in a metal modeled as a jellium the screening appears to be about 15%, which is neither negligible nor reconcilable with the old full-screening point of view.Comment: 6 pages, 1 figur

Patterned Nanomagnetic Films

Nano-fabrication technologies for realising patterned structures from thin films are reviewed. A classification is made to divide the patterning technologies in two groups namely with and without the use of masks. The more traditional methods as well as a few new methods are discussed al in relation with the application. As mask less methods we discussed direct patterning with ions including FIB, nanopaterning with electron beams, interferometric laser annealing and ion beam induced chemical vapour deposition. The methods using masks are ion irradiation and projection, interference lithography, the use of pre-etched substrates and templates from diblock copolymers and imprint technologies. First a few remarks are given about the magnetic properties of patterned films but the main part of this paper is focussed on the various patterning technologies. Finally two important applications are summarized such as media for ultra high-density recording and magnetic logic devices. Nanometer scale magnetic entities (nanoelements, nanodots, nanomagnets) form a fast growing new area of solid-state physics including the new fields of applications

Oblique evaporation and surface diffusion

The special structure of obliquely evaporated films has its origin in shadowing phenomena during film growth. Because of shadowing, the film consists of bundles of inclined columns with the bundles being aligned perpendicularly to the vapour incidence direction. The column inclination angle lies between the film normal and the vapour incidence direction. Different models found in literature relating process parameters and film structure are discussed. It is found that surface diffusion plays an important role, especially with regard to the difference between random and directional surface diffusion. The latter is induced by the oblique evaporation process. A quantitative expression is given for the relation between process conditions and surface diffusion including the influence of substrate temperature, rate and contamination with residual gasses. Using these models and adding our new calculations, the relation between surface diffusion and film structure is discussed in detail and found to be consistent with measurements published in the literature