Defects in amorphous phase-change materials

Understanding the physical origin of threshold switching and resistance drift phenomena is necessary for making a breakthrough in the performance of low-cost nanoscale technologies related to nonvolatile phase-change memories. Even though both phenomena of threshold switching and resistance drift are often attributed to localized states in the band gap, the distribution of defect states in amorphous phase-change materials (PCMs) has not received so far, the level of attention that it merits. This work presents an experimental study of defects in amorphous PCMs using modulated photocurrent experiments and photothermal deflection spectroscopy. This study of electrically switching alloys involving germanium (Ge), antimony (Sb) and tellurium (Te) such as amorphous germanium telluride (a-GeTe), a-Ge15Te85 and a-Ge2Sb2Te5 demonstrates that those compositions showing a high electrical threshold field also show a high defect density. This result supports a mechanism of recombination and field-induced generation driving threshold switching in amorphous chalcogenides. Furthermore, this work provides strong experimental evidence for complex trap kinetics during resistance drift. This work reports annihilation of deep states and an increase in shallow defect density accompanied by band gap widening in aged a-GeTe thin film

Highly conductive p-type nc-SiO_X:H thin films deposited at 130°C via efficient incorporation of plasma synthesized silicon nanocrystals and their application in SHJ solar cells

We present highly conductive and transparent p-type hydrogenated nanocrystalline silicon oxide (p-type nc-SiOX:H) layers produced by Plasma Enhanced Chemical Vapor Deposition (PECVD) at 130°C and 150°C. We report on the crystalline volume fraction (XC), spectral broadening parameter C, and dark conductivity (σ) as functions of the growth temperature and RF power, and how these properties evolve with post-deposition annealing at 250°C and 300°C. Interestingly, we observe that the best layers in terms of crystalline volume fraction and conductivity are obtained at the lowest temperature and RF power, which we attribute to the soft landing of silicon nanocrystals synthesized in the plasma. The p-type nc-SiOX:H layers with the best properties on glass substrates are implemented as carrier-selective contacts in silicon heterojunction (SHJ) solar cells with the structure: (n) a-Si:H / (i) a-Si:H / n-type c-Si / (i) a-Si:H / (i) a-SiOX:H / (p) nc-SiOX:H / (p) nc-Si:H where all films are deposited by PECVD. The cells were completed with sputtered ITO on the front and rear sides plus Ag on the rear side, and Ag grid on the front, with the best devices showing conversion efficiencies of 21.8%, which, contrary to a-Si:H contact layers, are preserved or even slightly improved upon annealing at 240°C.</p

Epitaxy and characterization of InP/InGaAs tandem solar cells grown by MOVPE on InP and Si substrates

The integration of III-V multi-junction solar cells on Si substrates is currently one of the most promising possibilities to combine high photovoltaic performance with a reduction of the manufacturing costs. In this work, we propose a prospective study for the realization of an InP/InGaAs tandem solar cell lattice-matched to InP on a commercially available Si template by direct MOVPE growth. The InP top cell and the InGaAs bottom cell were firstly separately grown and optimized using InP substrates, which exhibited conversion efficiencies of 13.5% and 11.4%, respectively. The two devices were then combined in a tandem device by introducing an intermediate InP/AlInAs lattice-matched tunnel junction, showing an efficiency of 18.4%. As an intermediate step towards the realization of the tandem device on Si, the InP and InGaAs single junction solar cells were grown on top of a commercial InP/GaP/Si template. This transitional stage enabled to isolate and evaluate the effects of the growth of III-V on Si on the photovoltaic performance through the comparison with the aforementioned devices on InP. Each cell was electrically characterized by external quantum efficiency and dark and illuminated current-voltage under solar simulator. The material quality was also analyzed by means of X-ray diffraction, Atomic-Force Microscopy, Transmission Electron and Scanning Electron Microscopy. The III-V on Si devices showed efficiencies of 3.6% and 2.0% for the InP and InGaAs solar cells, respectively

Electronic techniques for the characterization of silicon thin films

LGEP 2011 ID = 928International audienc

Materials for photovoltaic applications

International audienc

Materials for photovoltaic applications

International audienc