Influence of air diffusion on the OH radicals and atomic O distribution in an atmospheric Ar (bio)plasma jet

Treatment of samples with plasmas in biomedical applications often occurs in ambient air. Admixing air into the discharge region may severely affect the formation and destruction of the generated oxidative species. Little is known about the effects of air diffusion on the spatial distribution of OH radicals and O atoms in the afterglow of atmospheric-pressure plasma jets. In our work, these effects are investigated by performing and comparing measurements in ambient air with measurements in a controlled argon atmosphere without the admixture of air, for an argon plasma jet. The spatial distribution of OH is detected by means of laser-induced fluorescence diagnostics (LIF), whereas two-photon laser-induced fluorescence (TALIF) is used for the detection of atomic O. The spatially resolved OH LIF and O TALIF show that, due to the air admixture effects, the reactive species are only concentrated in the vicinity of the central streamline of the afterglow of the jet, with a characteristic discharge diameter of similar to 1.5 mm. It is shown that air diffusion has a key role in the recombination loss mechanisms of OH radicals and atomic O especially in the far afterglow region, starting up to similar to 4mm from the nozzle outlet at a low water/oxygen concentration. Furthermore, air diffusion enhances OH and O production in the core of the plasma. The higher density of active species in the discharge in ambient air is likely due to a higher electron density and a more effective electron impact dissociation of H2O and O-2 caused by the increasing electrical field, when the discharge is operated in ambient air

Operation of 13.56 MHz RF discharge in long gaps from sub-atmospheric to atmospheric pressure

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Plasma-Assisted Nitrogen Fixation in the Presence of Water

peer reviewe

Influence of air diffusion on the OH radicals and atomic O distribution in an atmospheric Ar (bio)plasma jet

Treatment of samples with plasmas in biomedical applications often occurs in ambient air. Admixing air into the discharge region may severely affect the formation and destruction of the generated oxidative species. Little is known about the effects of air diffusion on the spatial distribution of OH radicals and O atoms in the afterglow of atmospheric-pressure plasma jets. In our work, these effects are investigated by performing and comparing measurements in ambient air with measurements in a controlled argon atmosphere without the admixture of air, for an argon plasma jet. The spatial distribution of OH is detected by means of laser-induced fluorescence diagnostics (LIF), whereas two-photon laser-induced fluorescence (TALIF) is used for the detection of atomic O. The spatially resolved OH LIF and O TALIF show that, due to the air admixture effects, the reactive species are only concentrated in the vicinity of the central streamline of the afterglow of the jet, with a characteristic discharge diameter of similar to 1.5 mm. It is shown that air diffusion has a key role in the recombination loss mechanisms of OH radicals and atomic O especially in the far afterglow region, starting up to similar to 4mm from the nozzle outlet at a low water/oxygen concentration. Furthermore, air diffusion enhances OH and O production in the core of the plasma. The higher density of active species in the discharge in ambient air is likely due to a higher electron density and a more effective electron impact dissociation of H2O and O-2 caused by the increasing electrical field, when the discharge is operated in ambient air

The use of laser excited ro-vibrational spectra of OH radicals as a probe of a gas phase composition

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Target heating and plasma dynamics during hot magnetron sputtering of Nb

Abstract In this work, the direct current (DC) hot magnetron sputtering (HMS) of Nb has been studied and compared with the conventional cold magnetron sputtering (CMS) discharge. Particularly, these two magnetron systems were investigated in terms of current–voltage trends, behaviour of spectral lines, target temperature, and deposition rate. The current–voltage evolution showing strong variations over time in the HMS system was used to monitor the moment when thermionic emission becomes considerable. Meanwhile, thanks to the time-resolved optical emission spectroscopy (OES), the dynamics of plasma particles and the population of their electronic levels were analysed as a function of the target temperature. The target temperature was measured owing to both pyrometry and OES-based approach, i.e. by fitting an emission spectrum baseline. Finally, in the HMS configuration used in this work, the deposition rate up to 100 nm min−1 was obtained at the applied power density of 30 W cm−2, which is three times higher than the maximum power density applicable to the classical CMS system. However, with further increase in the power density, the deposition rate values were found to be saturated, which is likely caused by a significant increment in a number of thermal electrons in the discharge area.</jats:p